纳米医学与纳米技术杂志

抽象的

A Note on Fabrication of Nano Mold for Nanoimprint Lithography

Yeog Son

In order to create inversed patterns, nanoimprint lithography applies nanomolds to resists. It may be used to quickly and cheaply produce high resolution nanopatterns on both curved and flat surfaces. The quality of the nanoimprinted features depends on how faithfully the manufactured master nanopatterns and elastomer nanomolds are made. Despite extensive study into two-dimensional nanoimprint lithography, nothing is known about three-dimensional master nanopatterns and nanomolds. Even fewer of them talked about the consistency of complete processes from the creation of the original master to the final nanoimprinting. With the help of an atomic force microscope (AFM) and ultrasonic vibration assisted nanomachining, we were able to create three-dimensional master nanopatterns with intricate curves and constant height changes, as we showed in this paper. Using nanomolds the creation of the master nanopatterns with a positive draught, which comes naturally from the AFM tip, nanomolds for nanoimprint lithography were created. We looked into the accuracy of the outcomes produced by nanomachining and the aftereffects of recycling material patterns. Additionally, we showed that the solventassisted microcontact moulding process is capable of 3D nanoimprinting, and we found a way to adjust the layer-thickness of imprinted 3D nanopatterns.